Electrostatic Accelerators for Ion Implantation for High-Power Semiconductor Devices

The Ion Beam Centre (IBC) at the HZDR - Helmholtz Center Dresden Rossendorf - is studying the implantation of ions: particle accelerators are used to introduce ions into materials such as semiconductors in order to modify their electrical or physical properties. This makes the electronic components more energy-efficient or speeds up switching processes. The IBC is a world leader in the use of ion beams and offers unique analyses and standardised services in this field. The group is continuously optimising its tandem accelerator facilities to provide external researchers and international industrial customers with more beam time.